CN EN

SINO-Plasma 100 Glue remover

 
PRODUCT INTRODUCTION
SINO-Plasma 100 is a single-chamber plasma stripper  equipment independently developed by AMTE. It is equipped with high-precision transmission arm, inductively coupled plasma (ICP) source and high-precision temperature control module. The operating system is self-developed by AMTE with windows as operation platform, large LCD touch panel, simple and convenient operation interface. The equipment has the advantages of small space occupation, low consumables and operating costs. It is the best choice for photoresist removal in the semiconductor front end process and back end process.

APPLICATIONS
· 4-8 inch silicon based semiconductor production line
· Plasma stripper application of 4-6 inch SiC, GaN and GaAs production lines
· Packaging and testing process, MEMS and other applications

ADVANTAGES
· High precision transmission platform
· High etching rate
· Professional programming design, location interlocking and product protection.
· Visual operation interface with large touch screen
· Low consumption and maintenance cost of reaction chamber kit
· Can provide a variety of new process development and solutions

TECHNICAL PARAMETERS
Equipment Availability / Uptime: ≥92
WPH: >30
Strip Rate: >6,0000 A/min
Strip Rate Uniformity: <5%
Substrate Loss: <15A



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