CN EN

rainbow series V1.0

 

Rainbow series plasma etching machine  4420、4520、4720 Series Plasma Etcher
PRODUCT INTRODUCTION
Rainbow equipment is a traditional single chamber etching equipment of Lam, with the minimum etching line width of 0.5 μ m. Mainly used for etching silicon oxide, silicon nitride, polysilicon, silicon and metal materials of wafer with 8'' or under 8'' . Rainbow equipment covers a small area and has high equipment integration, which is suitable for large-scale production. The equipment is equipped with powerful RF system and gas system, which can accomplish the compatible development of various processes. Rainbow series equipment can be equipped with the options of electrostatic adsorption, envision system, etc., which can be chosen according to different process requirements. Rainbow equipment had very large market share, strong spare parts channels is AMTE’s strength.

APPLICATIONS
6'' and 8'' traditional silicon-based semiconductor production line.

APPLICATIONS AFTER UPGRADE
4'' and 6'' SiC, GaN, GaAs process line

ADVANTAGES AFTER UPGRADE
· Optional Envision operating system for easier operation, stronger data recording and data communication
· 8 MFC pipelines can be customized and compatible with various etching processes for R&D
· Upgrade the transfer and chamber kit to match the transfer and matching process of transparent film and thin wafer.
· Can be customized to upgrade the RF system
· High precision bias RF can be customized to achieve low-damage etching of GaN, GaAs and other materials
· Customized vacuum system can be upgraded, molecular pumps can be added and pressure stability system can be upgraded. Customized RF system can meet the requirements of special process ratio, high aspect ratio and smaller line width
· Provide a variety of new process development and solutions
· The software has safe and convenient authority management, humanized operation interface and perfect logging function, supporting factory automation



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