ALD atomic layer deposition equipment 
• Thin film coating technology.
• Precise control of film thickness and structure up to nanometer level.
• In fine nanostructures, the films can have high consistency and shape retention.
• Tight, pinhole free, defect free film.
• Good repeatability.
• The process temperature is low and can be deposited on temperature sensitive substrate.

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The SINO ALD series of Yiwen
• The process application types of products include oxides, nitrides, metals, etc.
• It is applied to Si based process, compound, MEMS field, filter, optical communication, display, optical micro processing and other fields.
• The corresponding product types can be given according to the user's product requirements, which are suitable for different application needs of universities, research and development lines, pilot lines, and large-scale production lines.
• It can provide different process needs and customized process schemes (such as low-temperature process, plasma ALD process, etc.) according to user application scenarios.
• Low operating costs.