SINO ALD R200 R&D and small batch film deposition equipment

Process application
Scientific research verification, conversion to small batch production and trial production

Wafer size
8 inches and below

Sedimentary materials
Oxides: Al2O3, AlxTiyOz, HfO2, In2O3, MgO, SiO2, SrTiO2, Ta2O5, TiO2, Y2O3, ZnO, ZnO: Al, ZrO2, La2O3, CeO2
Nitride: AlN, TiAlCN, TiN, TaNx
Metals: Cu, Co, Ir, Pd, Pt, Ru

Application area
Mini LED, Micro LED, UVC LED and vehicle outdoor lighting LED, optical lens (need to be laminated), AR grating, MEMS sensor, SAW&BAW filter.