centura 5200 series V1.0
Centura 5200平台 DPS、eMax、Super-E、CVD
Centura 5200 is AMAT automatic multiple chamber equipment platform, which can install up to 6 chambers. The etching chambers include DPS Poly, DPS Metal, eMax, Super-E, MxP, MxP+, etc., which can be used for etching silicon oxide, silicon nitride, polysilicon, silicon and metal materials. The CVD chamber includes DxZ, CxZ, TxZ and WxZ, which can be used for chemical vapor deposition of silicon oxide, silicon nitride and other dielectric materials as well as TiN and W.
Centura 5200 platform has high space utilization and stable transmission platform. VHP transmission arm is optional to improve equipment utilization, which is suitable for large-scale production lines. At the same time, the equipment is equipped with powerful RF system and gas system, which can accomplish the compatible development of various processes. The platform has simple operation interface and can choose suitable configuration according to different process requirements. Centura 5200 had very large market share, strong spare parts channels is AMTE’s strength.
6'' and 8'' traditional silicon production line
APPLICATIONS AFTER UPGRADE
6'' SiC, GaN, GaAs process line
ADVANTAGES AFTER UPGRADE
· Optional LCD touch panel provides more convenient operation
· Optional dual hard disk automatic backup system to ensure data security
· Upgrade the transfer and chamber kit to match the transfer and matching process of transparent film and thin wafer.
· Provide a variety of new process development and solutions
· Customized equipment can be configured with different chambers to achieve multi-purpose