SINO Plasma2000 PECVD
Time:2022/12/01 15:58:51
Process application
α-Si,SiO2,SixNy,PSG,BPSG
Wafer size
8 inches and below
Applicable substrate material
Silicon, silicon carbide, gallium nitride, gallium arsenide, sapphire, quartz glass
Chamber type
Multichip type